Translations by Torsten Bronger
Torsten Bronger has submitted the following strings to this translation. Contributions are visually coded: currently used translations, unreviewed suggestions, rejected suggestions.
| 1. |
{user_name} uses {apparatus}
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| 2010-08-31 |
{user_name} benutzt {apparatus}
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| 2. |
Dear supervisors of {apparatus_plural},
{user_name} has created their first {apparatus}.
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| 2010-08-31 |
Liebe Verantwortliche für {apparatus_plural},
{user_name} hat gerade seinen/ihren ersten Prozess „{apparatus}“ eingepflegt.
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| 3. |
carrier
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| 2010-04-15 |
Carrier
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| 4. |
6-chamber deposition
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| 2010-04-15 |
6-Kammer-Deposition
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| 5. |
6-chamber depositions
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| 2010-04-15 |
6-Kammer-Depositionen
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| 6. |
Can add 6-chamber depositions
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| 2010-08-31 |
Darf 6-Kammer-Depositionen hinzufügen
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| 7. |
Can edit perms for 6-chamber depositions
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| 2010-08-31 |
Darf die Berechtigungen für 6-Kammer-Depositionen ändern
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| 8. |
Can view all 6-chamber depositions
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| 2010-07-28 |
Darf alle 6-Kammer-Depositionen sehen
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| 9. |
6-chamber deposition lab
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| 2010-04-15 |
6-Kammer-Depositionslabor
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| 10. |
in sccm
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| 2010-04-15 |
in sccm
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| 11. |
2% PH₃ in SiH₄
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| 2010-04-15 |
2% PH₃ in SiH₄
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| 12. |
1% TMB in He
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| 2010-04-15 |
1% TMB in He
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| 13. |
5ppm B₂H₆ in H₂
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| 2010-04-15 |
5ppm B₂H₆ in H₂
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| 14. |
10 ppm PH₃ in H₂
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| 2010-04-15 |
10 ppm PH₃ in H₂
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| 15. |
deposition
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| 2010-04-15 |
Deposition
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| 16. |
chamber
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| 2010-04-15 |
Kammer
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| 17. |
deposition pressure
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| 2010-04-15 |
Depositionsdruck
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| 18. |
with unit
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| 2010-04-15 |
mit Einheit
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| 19. |
deposition time
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| 2010-04-15 |
Depositionszeit
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| 20. |
format HH:MM:SS
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| 2010-04-15 |
Format HH:MM:SS
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| 21. |
substrate–electrode distance
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| 2010-04-15 |
Abstand Substrat–Elektrode
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| 22. |
in mm
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| 2010-04-15 |
in mm
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| 23. |
comments
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| 2010-04-15 |
Kommentare
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| 24. |
transfer in the chamber
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| 2010-04-15 |
Transfer in die Kammer
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| 25. |
pre-heat
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| 2010-04-15 |
Pre-Heat
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| 26. |
gas of gas pre-heat
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| 2010-04-15 |
Gas im Gas-Pre-Heat
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| 27. |
pressure of gas pre-heat
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| 2010-04-15 |
Druck im Gas-Pre-Heat
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| 28. |
time of gas pre-heat
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| 2010-04-15 |
Zeit des Gas-Pre-Heats
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| 29. |
heating temperature
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| 2010-04-15 |
Heiztemperatur
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| 30. |
in ℃
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| 2010-04-15 |
in ℃
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| 31. |
transfer out of the chamber
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| 2010-04-15 |
Transfer aus der Kammer
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| 32. |
plasma start power
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| 2010-04-15 |
Startleistung Plasma
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| 33. |
in W
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| 2010-04-15 |
in W
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| 34. |
plasma start with carrier
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| 2010-04-15 |
Plasma startet mit Carrier
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| 35. |
deposition frequency
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| 2010-04-15 |
Depositionsfrequenz
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| 36. |
in MHz
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| 2010-04-15 |
in MHz
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| 37. |
deposition power
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| 2010-04-15 |
Depositionsleistung
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| 38. |
base pressure
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| 2010-04-15 |
Basisdruck
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| 39. |
in Torr
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| 2010-04-15 |
in Torr
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| 40. |
6-chamber layer
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| 2010-04-15 |
6-Kammer-Schicht
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| 41. |
6-chamber layers
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| 2010-04-15 |
6-Kammer-Schichten
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| 42. |
layer {number} of {deposition}
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| 2010-07-28 |
Schicht {number} von {deposition}
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| 43. |
time
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| 2010-04-15 |
Zeit
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| 44. |
electr. dist./mm
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| 2010-04-15 |
Elektr.-Abst./mm
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| 45. |
P_start/W
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| 2010-04-15 |
P_start/W
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| 46. |
yes
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| 2010-04-15 |
ja
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| 47. |
no
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| 2010-04-15 |
nein
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| 48. |
p_base/Torr
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| 2010-04-15 |
p_Basis/Torr
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| 49. |
(in sccm)
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| 2010-04-15 |
(in sccm)
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| 50. |
5% PH₃ in H₂
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| 2010-07-28 |
5% PH₃ in H₂
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